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This question was closed without grading. Reason: No acceptable answer
Mar 21, 2020 09:14
4 yrs ago
17 viewers *
English term

etchingly remove photoresist etch residue material

English to French Tech/Engineering Electronics / Elect Eng composition pour l'électronique
A fifth aspect relates to methods of manufacturing an article comprising a microelectronic device, said method comprising contacting the microelectronic device with a composition for sufficient time to etchingly remove titanium nitride and/or photoresist etch residue material from the surface of the microelectronic device having same thereon, and incorporating said microelectronic device into said article, wherein the composition comprises, consists of or consists essentially of at least one oxidizing agent, at least one etchant, at least one activator, at least one oxidizing agent stabilizer, and at least one solvent.
Proposed translations (French)
3 enlever par décapage les résidus de matières photorésistantes

Discussion

Tony M Mar 22, 2020:
@ Asker Yes, that's how I understand it (having previously been involved with PCB fabrication); but what bothers me is thet 'etch' in there — of course the photoresist should still be there afetr etchig, is it simply that that they are referring to: the photoresist that is still there after etching?
orgogozo (asker) Mar 22, 2020:
Attention à "photorésistance" La résine photosensible (appelée aussi photorésine et parfois photorésist) est un matériau photosensible utilisé dans de nombreux procédés industriels,
Christian Fournier Mar 22, 2020:
@ Clem Je l'ai omis intentionnellement, considérant qu'il était sous-entendu. Ce que je comprends, c'est qu'il faut laisser suffisamment de temps à la composition pour enlever par décapage les résidus de matières photorésistantes qui sont difficiles à décaper.

Proposed translations

1 hr

enlever par décapage les résidus de matières photorésistantes

suggestion
Peer comment(s):
neutral Clem Deviers : N'avez-vous pas omis "etch"?
4 hrs
neutral Tony M : The problem is, 'etch' could be key here — from its position in the word order, it seems to suggest this is NOT the actual photoresist itself, but the 'etch residues' from it; I wonder if it simply means 'the photoresist remaining after etching'? Or not..
1 day 2 hrs
Hello Tony! I agree with your interpretation - please refer to my comment in the discussion.
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